Micro/Nano Fabrication Laboratory

This 5,000-square-foot clean room is used for the microfabrication of semiconductor and MEMS devices. Substrate sizes range up to six-inch diameter. A special strength of the lab is its ability to handle a wide variety of substrates, from the usual III-V and silicon semiconductor substrates, to the more unusual glass and metal and plastic foils used in novel display projects. The lab has a complete range of thin-film formation techniques available, such as plasma-enhanced chemical vapor deposition, thermal and electron-beam evaporators, sputterers, and high-temperature diffusion and oxidation. Another strength of the lab is pattern transfer by plasma, with five reactors dedicated to etching a wide range of thin films. The recent focus on nanopatterning capabilities prompted an installation of the state-of-the-art laser writer, nanoimprinter, and a modern electron beam writer.

Some examples of the structures fabricated in the laboratory: