PRISM

Equipment List, PRISM Micro/Nano Fabrication Lab, Princeton University
Classification	# / Make / Model	Equipment	Use
Thermal Process	1. Thermco / Brute IV	Horizontal tube furnaces	Steam and dry silicon oxidation and annealing
		Tube 1	Clean metal anneal (Ti or Al)
		Tube 2	Anealing and oxidation
		Tube 3	Clean Si anneal and oxidation
	2. AG Associates / Mini-Pulse	Rapid thermal anealer	Ultra fast heating for annealing metal contacts (III-V compounds)
	3. Modular Process Technology Corp.	Silicon rapid thermal anealer	Ultra fast heating for annealing metal contacts (silicon)
	4. Tystar Tytan Stack Four Horizontal tube furnaces LPCVD	Tube 1	Oxidation of clean silicon (No metal)
		Tube 2	Poly-Silicon (No metal)
		Tube 3	Thermal nitride (No metal)
		Tube 4	TEOS low temp oxide (No metal)
	5. CVD 2 Stack Furnace	Horizontal tube furnaces	Tube 1 Wet oxidation
	5. CVD 2 Stack Furnace	Horizontal tube furnaces	Tube 2 sealed ampoule diffusion
Metals/Dielectrics	6. Denton / DV-502A	Electron beam evaporator	n-type and thin film deposition
	7. Edwards / E306A	Thermal evaporator	n-type and thin film deposition
	8. Innovative Systems	Electron beam evaporator	n-type and thin film deposition Ti, Cr, Ni, Au, Ge, Pt
	9. AJA Dielectric Sputterer	Sputter coater	Sputter dielectric films Si, SiO₂, SiNx
	10. Angstrom Sputterer	Sputter coater	Sputter Al, Al+1%Si, Au, Au+1%Sb, Mo, Ti, Pt, Ni, W, Cr
	11. Cambridge NanoTech / Savannah 100	Atomic layer deposition	Deposition of Al₂O₃
Dry Etch	12. Plasma-Therm / 790	Reactive ion etching and plasma enhanced chemical vapor deposition	Etching and deposition of thin films
			SiN_x, SiO₂, III-V, silicon, quartz
			RIE gases H₂, CH₄, CF₄, O₂, SF₆, CHF₃, Ar
			PECVD gases NH₃, SiH₄, N₂O, N₂, CF₄, Ar, He
	13. Plasma-Therm / 720 SLR	Reactive ion etching	Etching silicon, polysilicon, SiO₂
	13. Plasma-Therm / 720 SLR	Reactive ion etching	Etch gases BCl₃, Cl₂, Ar, O₂, CCl₂F₂, CF₄, H₂
	14. Astex ECR	Electron cyclotron resonance etcher	Super dense plasma etching of III-V’s
	14. Astex ECR	Electron cyclotron resonance etcher	Etch gases BCl₃, Cl₂, Ar, O_2,SF₆, CF₄
	15. TePla / M4L	Reactive ion etching	Surface treatment and cleaning, photoresist stripping, etching of plastics
	15. TePla / M4L	Reactive ion etching	Etch gases CF₄, O₂, Ar
	16. Technics / Micro 800	Reactive ion etching	Etching of thin films, SiN_x, SiO₂, photoresist
	16. Technics / Micro 800	Reactive ion etching	Etch gases O₂, CF₄+5%O₂
Measurement	17. KLA-Tencor / P-15	Surface profiler	2D and 3D step profiles, stress measurement
	18. Dektak / IIa	Surface profiler	Thin film step measurements
	19. NanoSpec / AFT	Interferometer measurement	Thin transparent film thickness measurement
	20. BioRad / ECV	ECV profiler	Dopant profiling
	21. Gaertner L3W16	Ellipsometer	Variable angle, three wavelength ellipsometer
	22. Olympus / MX40 .7-D700	Microscope w/ digital camera	High resolution reflected light microscope, brightfield, darkfield, Nomarski (DIC)
	23. Olympus / MX51	Microscope	High resolution reflected light microscope, brightfield and darkfield
	24. Nikon / Optiphot	Microscope	High resolution reflected light microscope for sample inspection
	25. Meiji / ML-BD-MET	Microscope	High resolution reflected and transmitted light microscope for sample inspection
	26. Leitz / SM LUX-HL	Microscope	High resolution reflected and transmitted light microscope for sample inspection
	27. Explorer / E 11140	Analytical balance	Digital balance with internal calibration, 110g maximum.
	28. Mitutoyo / 543-523-1	Digital indicator	Thickness measurement up to 30mm
	29. Mitutoyo / 543-256B	Digital indicator	Thickness measurement up to 12mm, low force
Lithography	30. Heidelberg / DWL66	Laser writer	Writing masks up to 6". Front and back side alignment, metrology.
	31. Karl Suss / MJB3	3" Mask aligner	3" sample, 4" mask, proximity or contact aligner. Infrared back alignment. Tolerance: approx. 1 micron
	32. Karl Suss / MA6	6" Mask aligner	Up to 6" samples, 2" - 7" masks, proximity or contact aligner
	33. Headway / Spinners	6" Spin coater	Spin coater for application of liquid thin films up to 4" diameter
	34. Headway / Spinners	14" Spin coater	Spin coater for application of liquid thin films up to 8" diameter
	35. Brewer Science/CEE 1100	6" Vacuum hot plate	Contact, proximity, and vacuum bake. N₂ atmosphere
	36. Electronic Micro Systems/ 1000-1	6" Vacuum hot plate	Contact and vacuum bake
	37. Nanonex / NX2000-4	4" Nanoimprinter	Nanoimprint lithography tool. Thermal & UV-curable imprint, optical alignment. Substrates up to 4" diameter.
	38. Nanonex/ NX-S-4	4" Separator	Separator for 4" imprinted wafers
	39. Yield Engineering Systems/YES-310TA	Image Reversal Oven	Vacuum baking, image reversal lithography, vapor prime process
	40. Raith / e_LiNE	4" electron beam writer	Writing samples and masks up to 4"
Miscellaneous
	41. UVOCS / T10X19 OES	UV / ozone cleaner	Ultraviolet / ozone removal of organic substances
	42. Varian / ML91	Sealed ampule diffusion	Glass ampoule sealing station for diffusion
	43. Buehler / Minimet 1000	Polisher, grinder	Grinder, polisher for small wafers
	44. South Bay Technologies	8" Polishing - Lapping Wheel	Grinder, polisher for small wafers
	45. SemiTool Spin-Dryers	Batch rinse and dry	Spin rinser dryer for 4" round wafers. Metal area
	46. SemiTool Spin-Dryers	Batch rinse and dry	Spin rinser dryer for 4" round wafers. Pre-furnace clean, (No metals)
	47. VWR / 1410	Vacuum / N₂ oven	Drying, curing, outgassing, annealing
	48. RCA Wet Hood	Various wet processing	RCA clean, piranha clean, Si₃N₄ etch
	49. CPD - 030	Critical Point Dryer	Drying samples
Packaging	50. Kulicke & Soffa / 982-6	Wafer dicing saw	Precision wafer dicing
	51. Research Devices / M8A	Flip-chip bonder	Programmable precision aligner and placement
	52. West Bond / 7400A	Wedge bonder	Ultrasonic and heated gold wire applicator, Au and Al
	53. Loomis / 789	Scribing tool	Scribing wafers
	54. West Bond / 7700B	Ball bonder	Ultrasonic and heated gold wire applicator, Au only
Troubleshooting	55. Varian / 979	Helium leak detector	Vacuum leak testing applications
Troubleshooting	56. Met One / GT-521	Particle counter	Hand-held laser particle counter