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General Information and Usage:
The wet bench has two plastic tanks for HF (BOE) etching, DI water rinse and four heated tanks. Two heated tanks are used to perform two steps of RCA clean. The other two heated tanks are used for H3PO4 and solution of H2SO4 and H2O2. So, the wet bench can only be used to do RCA clean, Si3N4 etching, and Piranha clean. For the hood layout click here.
Contact Information for Users of PRISM Micro/Nano Fabrication Lab:
For additional information regarding the Wet Hoods, please contact the PRISM Staff at: PRISM-CLEANRM-OPS@princeton.edu
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