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General Information and Usage:
NX-2000 nanoimprinter is a lithography tool able to replicate patterns at the micro to the nanoscale. The pattern replication is done by a mechanical deformation of the resist materials with a mask. A mask typically has a high density of nanoscale protrusion features on its surface and is treated to prevent sticking to the resist.
NX-2000 imprints samples up to 4 inch diameter. The maximum achievable pressure is 600 psi and the maximum temperature is 300°C. Xe lamp is used for the exposure of the UV-curable resists. The machine has three operating modes: (a) Thermal imprint (A resist-coated substrate and a mask are heated and pressed together. After cooling down, the mask is removed.), (b) UV imprint (Substrate coated with UV-resist and a mask are pressed together. The resist is exposed through the transparent mask. The mask is removed after the resist is cured.), and, (c) UV imprint with alignment (Same as (b) but the mask and the substrate are aligned prior to imprinting.) The alignment is done in MA6 using special substrate chuck. A separator located in the nanoimprint hood can be used to separate 4 inch wafers and masks after imprinting.
Contact Information for Users of PRISM Micro/Nano Fabrication Lab:
For additional information regarding the Nanonex NX-2000 nanoimprinter, please contact the PRISM Staff at: PRISM-CLEANRM-OPS@princeton.edu
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