MA6 6" Mask Aligner Manufacturer: Karl Suss Operating Instructions Authorized Users

General Information and Usage:
MA6 mask aligner offers standard front-side illumination (no back-side IR illumination) for the substrates up to 6-inch diagonal. Variety of mask holders can accommodate masks from 4 to 6-inch with the following "exposure windows": 2, 3, 4, and 6-inch round, and 3-inch square. Exchangeable substrate chucks will accommodate substrates from 1 cm² up to 6-inch diagonal. For the exposure illumination (mercury lamp) one can choose between 365nm (CI1) and 405nm (CI2). On a side note, be sure that you are in either CI1 or CI2 and not CP (constant power) to ensure proper exposure. The user also can select one of five exposure modes: soft contact, hard contact, proximity, vacuum, and low vacuum mode. In the soft contact mode the vacuum securing the sample on the chuck is not removed during the exposure. In the hard contact mode the vacuum securing the sample on the chuck is removed, and nitrogen is introduced under the sample. The nitrogen pressure increases the force which presses the sample against the mask. Proximity contact reduces the damage to the mask by leaving a small gap between the substrate and the mask when exposing. As a result, anything smaller than 10 microns will not be resolved accurately. In addition, this requires a special mask holder (only the mask holder with 4-inch round opening can be used). In the vacuum mode, the rubber seal of the substrate chuck (requires special chuck, only the 4-inch round substrate chuck with the rubber seal on the perimeter can be used) is inflated thus creating a chamber between chuck and the mask. This chamber is then evacuated and the vacuum securing the sample to the chuck is removed. Unlike in the low vacuum mode, the vacuum in the chamber cannot be adjusted.

Cleanroom Provided Photoresists	Thickness @ 4000 rpm	Developer Ratio to DI Water
1505	0.5 mm	400K, 1:3
4110	1.1 mm	400K, 1:4
5214	1.4 mm	300MIF undiluted or 400K 1:3.5
4330	3.3 mm	400K 1:4

Recipes:
ma6_0001: Standard Procedure for Positive Tone Photolithography (Using AZ5214-E).

Contact Information for Users of PRISM Micro/Nano Fabrication Lab:
For additional information regarding the MA6 Mask Aligner, please contact the PRISM Staff at: PRISM-CLEANRM-OPS@princeton.edu

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