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General Information and Usage:
MJB3 mask aligner offers a standard front-side illumination as well as back-side IR illumination. Three different mask holders will accommodate masks from 2-inch-square to 4-inch-square. For the exposure illumination (mercury lamp) one can choose between two wavelengths: 365nm (CI1) and 405nm (CI2). On a side note, be sure that the lamp power supply is set to either CI1 or CI2, as CP (Constant Power) mode will not allow for the proper intensity during the exposure. The maximum sample size is 3-inch diagonal or 3-inch square. There are two options for the exposure mode: (i) High Precision (HP), and (ii) Standard (ST) mode. In the HP mode, a vacuum is pulled between mask and the substrate just before exposure. The highest possible resolution is obtained in this mode. In the standard mode, one can choose either hard contact or soft contact mode. Unless the HP or SOFT CONTACT button is pushed, exposure will be performed with nitrogen pressing the substrate against the mask - hard contact mode. Soft contact mode is achieved when the ST and SOFT CONTACT buttons are lit. In such a case, only mechanical pressure presses the substrate against the mask. During exposure, the vacuum securing the substrate to the chuck remains, and no nitrogen is applied.
| Cleanroom Provided Photoresists |
Thickness @ 4000 rpm |
Developer Ratio to DI Water |
| 1505 |
0.5 mm |
400K, 1:3 |
| 4110 |
1.1 mm |
400K, 1:4 |
| 5214 |
1.4 mm |
300MIF undiluted or 400K 1:3.5 |
| 4330 |
3.3 mm |
400K 1:4 |
Contact Information for Users of PRISM Micro/Nano Fabrication Lab:
For additional information regarding the Karl Suss/MJB3 3" Mask Aligner, please contact the PRISM Staff at: PRISM-CLEANRM-OPS@princeton.edu
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