14-in Headway Spinners Manufacturer: Headway Research Operating Instructions

General Information and Usage:
Headway spinners are used to apply liquid material on a substrate. A typical spun liquid is photoresist, but other materials are possible. A few drops of photoresist are placed on the spinning substrate surface, flattening the liquid into a thin, continuous film. The thickness of the photoresist film depends on the spin speed and photoresist type. Photoresist manufacturers readily provide spin speed recommendations.
More than a dozen vacuum chucks are available to hold samples varying in size from several mm² up to an 8-inch diagonal. The spinners are programmable and hold 10 recipes, numbered 0 through 9. Recipes 0 through 8 contain frequently used recipes and the users may not change them. Program recipe 9 may be changed by any user.

Cleanroom Provided Photoresists	Thickness @ 4000 rpm	Developer Ratio to DI Water
1505	0.5 mm	400K, 1:3
4110	1.1 mm	400K, 1:4
5214	1.4 mm	312MIF 1:1 or 400K1:3.5
4330	3.3 mm	400K 1:4

Contact Information for Users of PRISM Micro/Nano Fabrication Lab:
For additional information regarding the Headway Spinners, please contact the PRISM Staff at: PRISM-CLEANRM-OPS@princeton.edu

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