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General Information and Usage:
The Edwards E306A Thermal Evaporator will evaporate a metal film over a substrate whose melting/softening point is higher than ~ 300°C. The metal source to be evaporated is placed in a filament or crucible, in which a large current is passed. The metal melts, and evaporates on the target substrate above the source, producing a film. Only metal or semiconductor targets should be used. The thickness of the metal is monitored in-situ by a thickness monitor. Even though the turret can accommodated up to four different materials, exchanged by manual rotation, the most common practice is to evaporate single material in one pump-down cycle. Often Al or Cr is evaporated, but the users are allowed to bring other materials. The evaporator is also used for Au-Zn deposition, so the resulting contamination and pumping limitation (due to the high vapor pressure of Zn) should be taken into consideration.
Contact Information for Users of PRISM Micro/Nano Fabrication Lab:
For additional information regarding the Edwards/E306, please contact the PRISM Staff at: PRISM-CLEANRM-OPS@princeton.edu.
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