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General Information and Usage:
CEE
1100 hot plate is located in the nanoimprint hood. It is used
for baking of spun-on resists for nanoimprinting. The maximum
temperature is 300ºC. Three bake styles are available: hard
contact, soft contact, and proximity bake. Hard contact is the
most accurate baking style since the substrate is held in
intimate contact by vacuum ports in the chuck itself. This
minimizes the bowing and warping of the substrate, leading to
the best bake uniformity and shortest bake times. In soft
contact, the substrate is held against the surface of the chuck
by gravity alone (no vacuum pulling on the substrate). This is
the least accurate method of baking. In proximity bake the
substrate floats on a pillow of nitrogen blown through the holes
in the chuck surface. The heating is slower, leading to longer
bake times. However, proximity bake may prevent resist cracking
due to the slower evaporation rate of the solvents from the
resists. We recommend using the proximity prebake followed by
the hard contact bake. Baking can be performed in the air or in
the nitrogen atmosphere. Ten user programs can be stored in the
system. Contact Information for Users of PRISM Micro/Nano Fabrication Lab:
For additional information regarding the Brewer Science
CEE 1100 Hot Plate, please contact the PRISM Staff at: PRISM-CLEANRM-OPS@princeton.edu
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