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General Information and Usage:
Ultra fast heating for annealing metal contacts in forming gas - general use (III-V compounds, etc.) No thermal paste is to be used in the RTA. Further, the user is required to know the decomposition temperature of the material placed in the RTA.
| Material |
Decomposition T ( 0C ) |
| InP |
370 |
| GaAs |
617 |
Contact Information for Users of PRISM Micro/Nano Fabrication Lab:
For additional information regarding the Rapid Thermal Annealer, please contact the PRISM Staff at:PRISM-CLEANRM-OPS@princeton.edu.
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