General Information and Usage:
is an electron beam lithography tool with a 100 mm by 100 mm
travel range. It uses thermal field emission filament
technology and a laser-interferometer controlled stage. The
column voltage varies from 100 eV to 30 keV and the laser stage
moves with a precision of 2 nm. There are six apertures on the
system: 7.5, 10, 20, 30, 60, and 120 mm. The electron beam
current is controlled by selecting the appropriate aperture.
The system is equipped with a load lock, an automatic height
sensing, and a fixed beam moving stage (FBMS). Typically, large
area patterns are divided into small writing fields that are
stitched together. The writing fields can vary from 500 nm to 2
mm. The individual fields are written one by one by scanning
the beam within the field. In the FBMS mode, the beam position
is fixed and the stage moves. This allows writing of long
features without stitching. Finally, three comprehensive software packages for proximity effect corrections,
3-D lithography, and metrology complete the tool.
seeking training and authorization for Raith e-LiNE must FIRST
receive general SEM training and gain competence in SEM use.
This can be covered by learning the Phillips XL30 SEM in the
PRISMís Imaging and Analysis Center (IAC). More information on
how to get this training can be found at
http://www.princeton.edu/~iac/ and http://webdb.princeton.edu/usite/publish.asp?site=IAC.
950k PMMA 4% and
P(MMA/MAA) copolymer 9%
available for PMMA dilution.]
Provided Developer: MIBK
[Users should mix with isopropyl alcohol (IPA)
themselves. Recommended MIBK: IPA = 1:3.]
Contact Information for Users of PRISM Micro/Nano Fabrication Lab:
For additional information regarding the Raith e_LiNE
e-beam writer, please contact the PRISM Staff at: PRISM-CLEANRM-OPS@princeton.edu
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