Micro/Nano Fabrication Laboratory

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Raith e_LiNE E-beam Writer

Manufacturer:
Raith

Operating Instructions

Authorized Users

General Information and Usage:

Raith e-LiNE is an electron beam lithography tool with a 100 mm by 100 mm travel range.  It uses thermal field emission filament technology and a laser-interferometer controlled stage.  The column voltage varies from 100 eV to 30 keV and the laser stage moves with a precision of 2 nm.  There are six apertures on the system: 7.5, 10, 20, 30, 60, and 120 mm.  The electron beam current is controlled by selecting the appropriate aperture.  The system is equipped with a load lock, an automatic height sensing, and a fixed beam moving stage (FBMS).  Typically, large area patterns are divided into small writing fields that are stitched together.  The writing fields can vary from 500 nm to 2 mm.  The individual fields are written one by one by scanning the beam within the field.  In the FBMS mode, the beam position is fixed and the stage moves.  This allows writing of long features without stitching. Finally, three comprehensive software packages for proximity effect corrections, 3-D lithography, and metrology complete the tool.  

Users seeking training and authorization for Raith e-LiNE must FIRST receive general SEM training and gain competence in SEM use.  This can be covered by learning the Phillips XL30 SEM in the PRISMís Imaging and Analysis Center (IAC). More information on how to get this training can be found at http://www.princeton.edu/~iac/ and http://webdb.princeton.edu/usite/publish.asp?site=IAC.

 

Cleanroom Provided Ebeam-resists:

950k PMMA 4% and P(MMA/MAA) copolymer 9%

[Chlorobenzene is available for PMMA dilution.]

Cleanroom Provided Developer: MIBK

[Users should mix with isopropyl alcohol (IPA) themselves. Recommended MIBK: IPA = 1:3.]

Contact Information for Users of PRISM Micro/Nano Fabrication Lab:
For additional information regarding the Raith e_LiNE e-beam writer, please contact the PRISM Staff at: PRISM-CLEANRM-OPS@princeton.edu




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